Project: Ion beam etching system for blades

Ion beam application, etching, or sputtering, is a technique conceptually similar to sandblasting, but using individual atoms in an ion beam to ablate a target.
In a vacuum chamber, the edge of each blade group is subjected to an ion beam treatment under pre-determined conditions using a plasma ion gun and argon as a medium, and is subjected to a plasma ion implantation of nitrogen plasma under predetermined conditions using a plasma ion implantation gun. As a result, it is possible to provide a blade member having an edge of a cutting quality enhanced by increasing the sharpness, a blade member having an edge of a rigidity enhanced by increasing the hardness, and a working apparatus capable of working those edges efficiently.

Developed for the NAGATA SEIKI Lab – Kai R&D Center Co., Ltd.

Development time: from 08/05/2004 to 11/08/2004.

Specifications:

  • Dimensions: Height 2 m, Width 1.2 m, Depth 1.7 m.

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